Our macroporous silicon consists of n- or p-doped single-crystal silicon which is being etched using an photo-electrochemical process.  The arrangement of the pores and the interpore distance are defined by a prestructured photo mask. The material can be used directly as a flow-through-membrane or as a one-side-closed template for the formation of macrostructures. 

Please have a look at our macroporous Silicon factsheet for more details about possible structures.

You can find the current available samples organized in different structure sizes (different pore distances) down below.